Holon Co., Ltd. Development, manufacturing, and marketing of semiconductor inspection tools and overall maintenance services

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ESPA-3000 Series (Wafer CD-SEM)

ESPA-3000

Wafer CD-SEM, ESPA-3000 is a novel tool (HOLON re-entered the market) enabling clear observation and measurement for specimen vulnerable to charging effect using the low vacuum technology implemented into the HOLON photomask CD-SEMs.

  • Compatible with various wafer sizes up to 8"
  • Low vacuum technology enabling stable observation and measurement of various samples vulnerable to charging effect
  • Compatible with various substrate materials such as Si / SiC / GaN / NIL mold
  • High sensivity EDS enabling easy and quick element analysis for particles.

Basic Specifications

Specimen 4" to 8" wafer
Resolution 3nm
Acc. Voltage 0.5kV~5kV
Probe Current 50pA~1nA
Repeatability (3sigma) 2nm or 1%
Transfer system C to C
ESPA image