CD-SEM for photomasks, a Holon flagship product, makes an indispensable role in the photomask fabrication process used in the manufacturing processes (fig. 1) of semiconductors. Tools necessary for the photomask
fabrication process are mainly divided into two types. One is e-beam writing (pattern forming) system and the other inspection (or repair) one. Holon provides e-beam inspection system.
A photomask is fabricated using a blank of quartz glass substrate, onto which patterns based on CAD formed GDS data are exposed by e-beam writer, and finally complete after inspection and repair processed.
(Photomask fabrication process)
Photomasks supplied to semiconductor fabs, are used for exposing in the photolithography processes (fig. 1) They are set up as negative plates in a stepper (reduced projection system) which enables exposing patterns onto wafers while exchanging scores of photomasks. Those used with a stepper are often referred to as "reticles."
* CD-SEM, short for Critical Dimension Scanning Electron Microscope, is an e-beam measurement tool.